Physical Vapour Deposition (PVD) is a process to produce a metal vapour (titanium, chromium and aluminium) that can be deposited on electrically conductive materials as a thin highly adhered pure metal or alloy coating. The process is carried out in a vacuum chamber using a cathodic arc source.
The coating compounds are made up of various elements such as carbides, nitrides, borides and silicides. A wide variety of colours can be achieved by adding different gasses during the deposition.
Why choose PVD Coating?